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UNBALANCED TYPE DE/RF BIASED MAGNETRON SPUTTERING NANO-FILM DEPOSITION SYSTEM

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UNBALANCED TYPE DE/RF BIASED MAGNETRON SPUTTERING NANO-FILM DEPOSITION SYSTEM

ORDINARY APPLICATION

Published

date

Filed on 4 September 2020

Patent Information

Application ID202031038219
Date of Application04/09/2020

Documents

NameDate
202031038219-(04-09-2020)-CLAIMS.pdf04/09/2020
202031038219-(04-09-2020)-DESCRIPTION (COMPLETE).pdf04/09/2020
202031038219-(04-09-2020)-DRAWINGS.pdf04/09/2020
202031038219-(04-09-2020)-FORM-1.pdf04/09/2020
202031038219-(04-09-2020)-FORM-2.pdf04/09/2020
202031038219-(04-09-2020)-FORM-3.pdf04/09/2020
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