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MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

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MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

ORDINARY APPLICATION

Published

date

Filed on 17 January 2017

Patent Information

Application ID201711001872
Date of Application17/01/2017

Documents

NameDate
201711001872-RELEVANT DOCUMENTS [30-09-2023(online)].pdf30/09/2023
201711001872-FORM 4 [28-09-2022(online)].pdf28/09/2022
201711001872-FORM 4 [01-09-2022(online)].pdf01/09/2022
201711001872-IntimationOfGrant20-02-2020.pdf20/02/2020
201711001872-PatentCertificate20-02-2020.pdf20/02/2020
201711001872-ABSTRACT [20-05-2019(online)].pdf20/05/2019
201711001872-CLAIMS [20-05-2019(online)].pdf20/05/2019
201711001872-FER_SER_REPLY [20-05-2019(online)].pdf20/05/2019
201711001872-OTHERS [20-05-2019(online)].pdf20/05/2019
201711001872-FER.pdf26/11/2018
Form 18 [14-02-2017(online)].pdf14/02/2017
201711001872-Correspondence-010217.pdf03/02/2017
201711001872-OTHERS-010217.pdf03/02/2017
201711001872-Power of Attorney-010217.pdf03/02/2017
Form 26 [30-01-2017(online)].pdf30/01/2017
Other Patent Document [30-01-2017(online)].pdf30/01/2017
Description(Complete) [17-01-2017(online)].pdf17/01/2017
Description(Complete) [17-01-2017(online)].pdf_193.pdf17/01/2017
Drawing [17-01-2017(online)].pdf17/01/2017
Form 3 [17-01-2017(online)].pdf17/01/2017
Form 5 [17-01-2017(online)].pdf17/01/2017
Power of Attorney [17-01-2017(online)].pdf17/01/2017
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