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LOW-K SIDE-WALL SPACER BASED INNER GATE ENGINEERED JUNCTIONLESS SILICON NANOTUBE FET

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LOW-K SIDE-WALL SPACER BASED INNER GATE ENGINEERED JUNCTIONLESS SILICON NANOTUBE FET

ORDINARY APPLICATION

Published

date

Filed on 5 August 2020

Patent Information

Application ID202011033495
Date of Application05/08/2020

Documents

NameDate
202011033495-Form 1-050820.pdf18/10/2021
202011033495-Form 2-050820.pdf18/10/2021
202011033495-Form 3-050820-.pdf18/10/2021
202011033495-Form 5-050820.pdf18/10/2021
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