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LOW-EMISSIVITY MATERIAL COMPRISING A SILICON NITRIDE- OR OXYNITRIDE-BASED LAYER AND A ZINC TIN OXIDE-BASED LAYER
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Abstract
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LOW-EMISSIVITY MATERIAL COMPRISING A SILICON NITRIDE- OR OXYNITRIDE-BASED LAYER AND A ZINC TIN OXIDE-BASED LAYER
PCT NATIONAL PHASE APPLICATION
Published
Filed on 8 November 2022
Patent Information
| Application ID | 202247064414 |
| Date of Application | 08/11/2022 |
Documents
| Name | Date |
|---|---|
| 202247064414-FORM 3 [02-03-2023(online)].pdf | 02/03/2023 |
| 202247064414-Proof of Right [02-03-2023(online)].pdf | 02/03/2023 |
| 202247064414.pdf | 12/11/2022 |
| 202247064414-COMPLETE SPECIFICATION [08-11-2022(online)].pdf | 08/11/2022 |
| 202247064414-DECLARATION OF INVENTORSHIP (FORM 5) [08-11-2022(online)].pdf | 08/11/2022 |
| 202247064414-FORM 1 [08-11-2022(online)].pdf | 08/11/2022 |
| 202247064414-POWER OF AUTHORITY [08-11-2022(online)].pdf | 08/11/2022 |
| 202247064414-PRIORITY DOCUMENTS [08-11-2022(online)].pdf | 08/11/2022 |
| 202247064414-STATEMENT OF UNDERTAKING (FORM 3) [08-11-2022(online)].pdf | 08/11/2022 |
