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FILM FORMATION METHOD AND FILM FORMATION DEVICE

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FILM FORMATION METHOD AND FILM FORMATION DEVICE

PCT NATIONAL PHASE APPLICATION

Published

date

Filed on 26 November 2024

Abstract

The present invention is a film formation method for discharging a mist onto a heated substrate from a nozzle and forming a crystalline oxide film via a mist CVD method, said method being characterized in that: the nozzle includes, at least, two or more gas inlets which face each other, a gas mixture part to which the gas inlets are provided, and a gas outlet from which the mist is discharged; and when the volume of the gas mixture part is defined as V (cm3), the linear velocity L (cm/second) of the mist at one of the two or more gas inlets which face each other is L=0.8V-200. Thus, provided are: a film formation method for forming a crystalline oxide film that has excellent crystallinity, that has a good in-plane film thickness distribution even when having a large surface area and a thin film thickness, and that has excellent semiconductor properties when used in a semiconductor device; and a film formation device for performing the film formation method.

Patent Information

Application ID202447092236
Invention FieldELECTRONICS
Date of Application26/11/2024
Publication Number48/2024

Inventors

NameAddressCountryNationality
WATABE Takenoric/o Advanced Functional Materials Research Center, SHIN-ETSU CHEMICAL CO., LTD., 13-1, Isobe 2-chome, Annaka-shi, Gunma 3790195JapanJapan
SAKATSUME Takahiroc/o Advanced Functional Materials Research Center, SHIN-ETSU CHEMICAL CO., LTD., 13-1, Isobe 2-chome, Annaka-shi, Gunma 3790195JapanJapan

Applicants

NameAddressCountryNationality
SHIN-ETSU CHEMICAL CO., LTD.4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1000005JapanJapan

Documents

NameDate
202447092236-FORM-26 [27-11-2024(online)].pdf27/11/2024
202447092236-COMPLETE SPECIFICATION [26-11-2024(online)].pdf26/11/2024
202447092236-DECLARATION OF INVENTORSHIP (FORM 5) [26-11-2024(online)].pdf26/11/2024
202447092236-DRAWINGS [26-11-2024(online)].pdf26/11/2024
202447092236-FORM 1 [26-11-2024(online)].pdf26/11/2024
202447092236-FORM 18 [26-11-2024(online)].pdf26/11/2024
202447092236-PRIORITY DOCUMENTS [26-11-2024(online)].pdf26/11/2024
202447092236-PROOF OF RIGHT [26-11-2024(online)].pdf26/11/2024
202447092236-REQUEST FOR EXAMINATION (FORM-18) [26-11-2024(online)].pdf26/11/2024

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