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ELECTRON BEAM LITHOGRAPHY WITH A BILAYER RESIST
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Abstract
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ELECTRON BEAM LITHOGRAPHY WITH A BILAYER RESIST
CONVENTIONAL APPLICATION
Published
Filed on 16 September 2021
Patent Information
| Application ID | 202114041915 |
| Date of Application | 16/09/2021 |
Documents
| Name | Date |
|---|---|
| 202114041915-FORM 3 [21-12-2022(online)].pdf | 21/12/2022 |
| 202114041915-FORM 3 [08-07-2022(online)].pdf | 08/07/2022 |
| 202114041915-FORM 3 [25-02-2022(online)].pdf | 25/02/2022 |
| 202114041915-COMPLETE SPECIFICATION [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-DECLARATION OF INVENTORSHIP (FORM 5) [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-DRAWINGS [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-FORM 1 [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-POWER OF AUTHORITY [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-PROOF OF RIGHT [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-STATEMENT OF UNDERTAKING (FORM 3) [16-09-2021(online)].pdf | 16/09/2021 |
| 202114041915-TRANSLATIOIN OF PRIOIRTY DOCUMENTS ETC. [16-09-2021(online)].pdf | 16/09/2021 |
