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DEVELOPMENT OF CENTRIFUGAL DRYER FOR DRYING SILICON WAFER AFTER TEXURISATION

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DEVELOPMENT OF CENTRIFUGAL DRYER FOR DRYING SILICON WAFER AFTER TEXURISATION

ORDINARY APPLICATION

Published

date

Filed on 23 April 2021

Patent Information

Application ID202131018710
Date of Application23/04/2021

Documents

NameDate
202131018710-IntimationOfGrant05-10-2023.pdf05/10/2023
202131018710-PatentCertificate05-10-2023.pdf05/10/2023
202131018710-CLAIMS [05-06-2023(online)].pdf05/06/2023
202131018710-FER_SER_REPLY [05-06-2023(online)].pdf05/06/2023
202131018710-OTHERS [05-06-2023(online)].pdf05/06/2023
202131018710-FER.pdf06/12/2022
202131018710-Proof of Right [17-05-2021(online)].pdf17/05/2021
202131018710-FORM 18 [28-04-2021(online)].pdf28/04/2021
202131018710-Proof of Right [28-04-2021(online)].pdf28/04/2021
202131018710-COMPLETE SPECIFICATION [23-04-2021(online)].pdf23/04/2021
202131018710-DECLARATION OF INVENTORSHIP (FORM 5) [23-04-2021(online)].pdf23/04/2021
202131018710-DRAWINGS [23-04-2021(online)].pdf23/04/2021
202131018710-FORM 1 [23-04-2021(online)].pdf23/04/2021
202131018710-POWER OF AUTHORITY [23-04-2021(online)].pdf23/04/2021
202131018710-STATEMENT OF UNDERTAKING (FORM 3) [23-04-2021(online)].pdf23/04/2021

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