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DEPOSITION OF SILICON OXIDE BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

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DEPOSITION OF SILICON OXIDE BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

PCT NATIONAL PHASE APPLICATION

Published

date

Filed on 27 March 2014

Patent Information

Application ID2384/DELNP/2014
Date of Application27/03/2014

Documents

NameDate
2384-DELNP-2014-WithDrawalLetter.pdf21/11/2017
2384-DELNP-2014-Correspondence-171016.pdf19/10/2016
2384-DELNP-2014-Power of Attorney-171016.pdf19/10/2016
Form 26 [14-10-2016(online)].pdf14/10/2016
Other Document [14-07-2016(online)].pdf14/07/2016
2384-delnp-2014-Correspondence Others-(04-09-2014).pdf04/09/2014
2384-delnp-2014-Form-3-(04-09-2014).pdf04/09/2014
2384-delnp-2014-Assignment-(02-04-2014).pdf02/04/2014
2384-delnp-2014-Correspondence-Others-(02-04-2014).pdf02/04/2014
Complete specification.pdf02/04/2014
FORM 3.pdf02/04/2014
Form 5.pdf02/04/2014
PCT Cover page and PCT-ISA-237.pdf02/04/2014
PCT-304.pdf02/04/2014
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