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"CUSPED PERMANENT MAGNET ELECTRON CYCLOTRON RESONANCE-PLASMA ENHANCED-FILM DEPOSITION AND ETCHING SYSTEM"
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"CUSPED PERMANENT MAGNET ELECTRON CYCLOTRON RESONANCE-PLASMA ENHANCED-FILM DEPOSITION AND ETCHING SYSTEM"
ORDINARY APPLICATION
Published
Filed on 30 September 2015
Patent Information
| Application ID | 1029/KOL/2015 |
| Date of Application | 30/09/2015 |
Documents
| Name | Date |
|---|---|
| 1029-KOL-2015-(30-09-2015)-ABSTRACT.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-CLAIMS.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-DESCRIPTION (COMPLETE).pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-DRAWINGS.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-FORM-1.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-FORM-2.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-FORM-3.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-FORM-5.pdf | 30/09/2015 |
| 1029-KOL-2015-(30-09-2015)-FORM-9.pdf | 30/09/2015 |
