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COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS
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Abstract
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COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS
PCT NATIONAL PHASE APPLICATION
Published
Filed on 15 September 2023
Patent Information
| Application ID | 202347062097 |
| Date of Application | 15/09/2023 |
Documents
| Name | Date |
|---|---|
| 202347062097-FORM-26 [02-10-2023(online)].pdf | 02/10/2023 |
| 202347062097-COMPLETE SPECIFICATION [15-09-2023(online)].pdf | 15/09/2023 |
| 202347062097-DECLARATION OF INVENTORSHIP (FORM 5) [15-09-2023(online)].pdf | 15/09/2023 |
| 202347062097-DRAWINGS [15-09-2023(online)].pdf | 15/09/2023 |
| 202347062097-FORM 1 [15-09-2023(online)].pdf | 15/09/2023 |
| 202347062097-PRIORITY DOCUMENTS [15-09-2023(online)].pdf | 15/09/2023 |
