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A MULTILAYER GATE METAL OXIDE SEMICONDUCTOR FET FOR REDUCING SHORT CHANNEL EFFECT

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A MULTILAYER GATE METAL OXIDE SEMICONDUCTOR FET FOR REDUCING SHORT CHANNEL EFFECT

ORDINARY APPLICATION

Published

date

Filed on 8 May 2020

Patent Information

Application ID202041019570
Date of Application08/05/2020

Documents

NameDate
202041019570-IntimationOfGrant21-12-2021.pdf21/12/2021
202041019570-PatentCertificate21-12-2021.pdf21/12/2021
202041019570-ABSTRACT [27-10-2021(online)].pdf27/10/2021
202041019570-CLAIMS [27-10-2021(online)].pdf27/10/2021
202041019570-CORRESPONDENCE [27-10-2021(online)].pdf27/10/2021
202041019570-DRAWING [27-10-2021(online)].pdf27/10/2021
202041019570-FER_SER_REPLY [27-10-2021(online)].pdf27/10/2021
202041019570-OTHERS [27-10-2021(online)].pdf27/10/2021
202041019570-FER.pdf18/10/2021
202041019570-FORM-26 [28-06-2020(online)].pdf28/06/2020
202041019570-COMPLETE SPECIFICATION [08-05-2020(online)].pdf08/05/2020
202041019570-DRAWINGS [08-05-2020(online)].pdf08/05/2020
202041019570-FIGURE OF ABSTRACT [08-05-2020(online)].pdf08/05/2020
202041019570-FORM 1 [08-05-2020(online)].pdf08/05/2020
202041019570-FORM 18 [08-05-2020(online)].pdf08/05/2020
202041019570-FORM-9 [08-05-2020(online)].pdf08/05/2020
202041019570-REQUEST FOR EARLY PUBLICATION(FORM-9) [08-05-2020(online)].pdf08/05/2020
202041019570-REQUEST FOR EXAMINATION (FORM-18) [08-05-2020(online)].pdf08/05/2020
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