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A METHOD OF FABRICATING ZINC OXIDE BASED HETEROSTRUCTURE FOR HIGH ELECTRON MOBILITY TRANSISTOR

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A METHOD OF FABRICATING ZINC OXIDE BASED HETEROSTRUCTURE FOR HIGH ELECTRON MOBILITY TRANSISTOR

ORDINARY APPLICATION

Published

date

Filed on 1 March 2017

Patent Information

Application ID201721007309
Date of Application01/03/2017

Documents

NameDate
201721007309-IntimationOfGrant28-12-2023.pdf28/12/2023
201721007309-PatentCertificate28-12-2023.pdf28/12/2023
201721007309-CLAIMS [03-01-2022(online)].pdf03/01/2022
201721007309-FER_SER_REPLY [03-01-2022(online)].pdf03/01/2022
201721007309-FER.pdf18/10/2021
201721007309-FORM-8 [26-06-2021(online)].pdf26/06/2021
201721007309-FORM 18 [29-07-2020(online)].pdf29/07/2020
Abstract1.jpg11/08/2018
201721007309-Changing Name-Nationality-Address For Service [07-08-2017(online)].pdf07/08/2017
201721007309-ORIGINAL UNDER RULE 6 (1A)-19-05-2017.pdf19/05/2017
Other Patent Document [09-05-2017(online)].pdf09/05/2017
201721007309-ORIGINAL UNDER RULE 6(1A)-02-05-2017.pdf02/05/2017
Form 26 [22-04-2017(online)].pdf22/04/2017
Description(Complete) [01-03-2017(online)].pdf01/03/2017
Description(Complete) [01-03-2017(online)].pdf_271.pdf01/03/2017
Drawing [01-03-2017(online)].pdf01/03/2017
Form 3 [01-03-2017(online)].pdf01/03/2017
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